(t-Butylimido)tris(diethylamino)tantalum(V), min. 98% (99.99%-Ta) PURATREM TBTDET|73-0723|169896-41-7

(t-Butylimido)tris(diethylamino)tantalum(V), min. 98% (99.99%-Ta) PURATREM TBTDET

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Sku SC73-0723_1_G
US-Strem
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Product Information

Product Name
(t-Butylimido)tris(diethylamino)tantalum(V), min. 98% (99.99%-Ta) PURATREM TBTDET
Brand Name
US-Strem
Product Number
73-0723
CAS
169896-41-7
Certificate of Analysis (COA)​
COA not found

General Information

PubChem CID
4100858
IUPAC Name
tert-butyliminotantalum;tris(diethylazanide)
InChI Key
OAUVVCYTHMBYBP-UHFFFAOYSA-N
SMILES
CCN-CC.CCN-CC.CCN-CC.CC(C)(C)N=Ta

Application

Technical Note:
1. Useful precursor for the atomic layer deposition of tantalum oxide and tantalum nitride.
References:
1.Journal of Nanosci. and Nanotechno., 2013, 13, 4097. 2.Semicond. Sci. Tech., 2012, 27, 074003/1.
3.Chem. Vapor Depos., 2011, 17, 37. I
4.Electrochem. Solid St., 2010, 13, H426.
5. J. Electrochem. Soc., 2010, 157, H652.
6.J.Electrochem. Soc., 2009, 156, H852.

References

Study of ALD-Deposited TaN Properties
Publication Name: Russian Microelectronics
Publication Date: 2024-12
DOI: 10.1134/s1063739724600778