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Tetrakis(diethylamino)hafnium, 99% (99.99+%-Hf, <0.2% Zr) PURATREM|72-7750|19824-55-6

Tetrakis(diethylamino)hafnium, 99% (99.99+%-Hf, <0.2% Zr) PURATREM

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Sku SC72-7750_1_G
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Product Information

Product Name
Tetrakis(diethylamino)hafnium, 99% (99.99+%-Hf, <0.2% Zr) PURATREM
Brand Name
US-Strem
Product Number
72-7750
CAS
19824-55-6
Certificate of Analysis (COA)​
COA not found

General Information

PubChem CID
140612
IUPAC Name
tetrakis(diethylazanide);hafnium(4+)
InChI Key
VBCSQFQVDXIOJL-UHFFFAOYSA-N
SMILES
CCN-CC.CCN-CC.CCN-CC.CCN-CC.Hf+4

References Data Source From Pubchem

Growth and Characterization of Mixed Oxide Hf1−xScxOy (0 ≤ x ≤ 1) Films Prepared by the Atomic Layer Deposition Method
Publication Name: Journal of Electronic Materials
Publication Date: 2025-03-12
DOI: 10.1007/s11664-025-11865-z

Growth Features and Phase Composition of Hf–Sc–O thin Films Synthesized by Atomic Layer Deposition
Publication Name: Journal of Structural Chemistry
Publication Date: 2023-03
DOI: 10.1134/s0022476623030083

Front End of the Line Process
Publication Name: Atomic Layer Deposition for Semiconductors
Publication Date: 2013-10-19
DOI: 10.1007/978-1-4614-8054-9_7

Isolated nanographene crystals for nano-floating gate in charge trapping memory
Publication Name: Scientific Reports
Publication Date: 2013-07-03
DOI: 10.1038/srep02126

Hf-Based High-k Gate Dielectric Processing
Publication Name: Springer Series in Advanced Microelectronics
Publication Date: 2013
DOI: 10.1007/978-3-642-36535-5_4