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Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM|98-1955|75-24-1

Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM

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Sku SC98-1955_100_G
US-Strem
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Product Information

Product Name
Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM
Brand Name
US-Strem
Product Number
98-1955
CAS
75-24-1
Certificate of Analysis (COA)​
COA not found

General Information

PubChem CID
16682925
IUPAC Name
trimethylalumane
InChI Key
JLTRXTDYQLMHGR-UHFFFAOYSA-N
SMILES
CAl(C)C

Description

Technical Notes:
1.ALD/CVD precursor for aluminum oxide films using H20 vapor as a precursor for the thermal 2-9, O3 for low temperature10-17 and O2 plasma 18-22 for the plasma-enhanced processes
2.ALD/CVD precursor for the deposition of metal aluminate thin films 23-29
3.ALD/CVD precursor for various other aluminum containing thin films (see table)
References:
1.J. Phys. Chem. 1963, 67 677
2.J. Vac. Sci. Technol. A, 2018 36, 050602 3.Thin Solid Films 2000 368. 1
4.J. Appl. phys. 2005. 97 121301.
5.Crit. Rev. Solid State Mater. Sci.2013, 38203
6.Phys. Chem. chem. Phys. 2015. 17. 17322 7.J. Clean. Prod. 2016, 133 338
8. Surf. Sci. Spectra 2019, 26, 026001