Product Name
n-Hexylphosphonic acid, min. 97% HPA
Certificate of Analysis (COA)
IUPAC Name
hexylphosphonic acid
InChI Key
GJWAEWLHSDGBGG-UHFFFAOYSA-N
Product Introduction
n-Hexylphosphonic acid (CAS No. 4721-24-8) is a short-chain alkylphosphonic acid containing a hexyl group and a phosphonic acid functional group. Its molecular structure combines a hydrophobic alkyl chain with a strongly coordinating phosphonic acid head group.
n-Hexylphosphonic acid is used in nanomaterial synthesis, surface functionalization, semiconductor materials, nanoparticle coatings, molecular self-assembly, and materials chemistry. The phosphonic acid group has strong affinity for many metal and metal-oxide surfaces, making it useful for modifying surface chemistry and controlling organic–inorganic interfaces.
Its relatively short C6 alkyl chain can provide a balance between surface binding and hydrophobicity, making it useful for investigating surface adsorption, nanoparticle stabilization, and interfacial properties.
Mechanism / Principle
Surface Coordination and Functionalization
The phosphonic acid group of n-Hexylphosphonic acid can interact strongly with metal and metal-oxide surface sites.
In surface and nanomaterial research:
- The phosphonic acid group coordinates with surface metal centers.
- Surface adsorption introduces alkyl functionality to inorganic materials.
- The hexyl chain contributes hydrophobic characteristics.
- Surface modification can change wettability and interfacial energy.
- Adsorbed phosphonic acid molecules can form organized surface layers.
- Surface functionalization can improve compatibility between inorganic particles and organic components.
These properties make n-Hexylphosphonic acid useful for surface engineering, nanoparticle coating, and organic–inorganic interface studies.
Key Research Applications
1. Nanoparticle Surface Modification
n-Hexylphosphonic acid can be used as a surface ligand or modifier for inorganic nanoparticles.
Applications include:
- Nanoparticle functionalization
- Surface coating
- Colloidal stabilization
- Nanoparticle dispersion
- Surface chemistry research
2. Quantum Dot and Nanocrystal Research
Alkylphosphonic acids are useful surface ligands in colloidal nanocrystal research, including quantum-dot systems.
Applications include:
- Quantum-dot surface modification
- Semiconductor nanocrystals
- Nanocrystal ligand research
- Surface passivation
- Colloidal nanomaterials
3. Metal-Oxide Surface Functionalization
The phosphonic acid group has strong affinity for many metal-oxide surfaces.
Applications include:
- Metal-oxide surface modification
- Surface passivation
- Hydrophobic surface preparation
- Interface engineering
- Surface-energy control
4. Molecular Self-Assembly
n-Hexylphosphonic acid can be used to investigate the formation and organization of phosphonic-acid-based surface layers.
Applications include:
- Molecular self-assembly
- Surface adsorption
- Functional molecular layers
- Interfacial chemistry
- Surface-structure studies
5. Nanoparticle Coatings
n-Hexylphosphonic acid can introduce hydrophobic functionality onto nanoparticle surfaces.
Applications include:
- Hydrophobic nanoparticle coatings
- Organic–inorganic interfaces
- Nanoparticle surface engineering
- Colloidal materials
- Functional coatings
6. Semiconductor Materials Research
Surface ligands play an important role in controlling semiconductor nanocrystal properties.
Applications include:
- Semiconductor nanocrystals
- Surface passivation
- Electronic-material interfaces
- Nanocrystal processing
- Optoelectronic materials
7. Advanced Materials Research
n-Hexylphosphonic acid is useful for developing and studying functional materials with controlled surface and interfacial properties.
Applications include:
- Hybrid organic–inorganic materials
- Functional coatings
- Nanostructured materials
- Surface engineering
- Materials chemistry
Advantages
- Well-defined alkylphosphonic acid structure
- Strong surface-binding capability
- Useful for metal and metal-oxide surface modification
- Suitable for nanoparticle functionalization
- Applicable to semiconductor nanocrystal research
- Useful for hydrophobic surface engineering
- Suitable for molecular self-assembly studies
- Valuable reagent for organic–inorganic interface research
Storage & Handling
- Store in a tightly sealed container.
- Keep in a cool, dry environment.
- Protect from moisture and excessive humidity.
- Some commercial specifications recommend 2–8°C storage, while other suppliers specify ambient-temperature storage; follow the storage conditions of the specific product grade.
- Avoid unnecessary exposure to air and moisture.
- Avoid contact with strong bases and incompatible chemicals.
- Handle the powder carefully to minimize dust generation.
- Wear appropriate laboratory personal protective equipment.
- Consult the product-specific SDS before use.
Research Areas
Researchers working in the following fields may benefit from n-Hexylphosphonic acid (CAS No. 4721-24-8):
- Surface chemistry
- Nanomaterials
- Semiconductor materials
- Quantum dots
- Nanocrystals
- Materials science
- Molecular self-assembly
- Interface engineering
- Functional coatings
- Organic–inorganic hybrid materials
Q1: What is n-Hexylphosphonic acid?
A: n-Hexylphosphonic acid is an alkylphosphonic acid with CAS No. 4721-24-8 and molecular formula C₆H₁₅O₃P.
Q2: What is n-Hexylphosphonic acid used for?
A: It is mainly used in nanoparticle surface modification, semiconductor nanocrystal research, molecular self-assembly, surface functionalization, and materials chemistry.
Q3: What is the molecular weight of n-Hexylphosphonic acid?
A: The molecular weight is 166.16 g/mol. (fishersci.com)
Q4: What is the difference between n-Hexylphosphonic acid and Tetradecylphosphonic Acid?
A: Both are alkylphosphonic acids, but n-Hexylphosphonic acid has a C6 alkyl chain, whereas Tetradecylphosphonic Acid has a C14 alkyl chain. The different chain lengths can affect hydrophobicity, molecular packing, surface coverage, and interfacial properties.
Q5: Can n-Hexylphosphonic acid modify metal-oxide surfaces?
A: Yes. Its phosphonic acid group has strong affinity for many metal-oxide surfaces, making it useful for surface functionalization and interface engineering.
Q6: Is n-Hexylphosphonic acid used in nanomaterial synthesis?
A: Yes. It is used in research involving quantum dots, nanoparticles, nanocrystals, and nano-ceramics, including surface coating and functionalization.
Q7: What is the physical form of n-Hexylphosphonic acid?
A: It is generally supplied as a white powder with a melting point around 108–110°C.
Q8: How should n-Hexylphosphonic acid be stored?
A: Store tightly sealed in a cool, dry environment and protect it from moisture. Follow the storage conditions specified for the particular commercial grade.
