CAS # | 3275-24-9 |
SMILES | |
Chemical Purity | |
Molecular Formula | Ti[N(CH3)2]4 |
Chemical Formula | |
Formula Weight | 224.20 |
Reaction | |
Note |
$608.00
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Sku SC93-2240_25_G
US-Strem
General Details
Physical Properties
Purity | 99% |
Density | |
Melting Point | |
Boiling Point | |
Flash Point | -22°F |
Vapor Pressure | |
Surface Area | |
Pore Volume | |
Specific Rotation |
Shipping & Stability
Safety | No |
Days to Ship | |
Store Cold | |
Dry Ice | |
Alternative Product for Air Shipment | |
Export Limitations | |
Pyrophoric | |
Hygroscopic | |
Air Sensitive | |
Light Sensitive | |
Heat Sensitive | |
Moisture Sensitive | |
Odorous Material |
Technical Notes:
1.ALD/CVD precursor mainly used for TiN [1 ,review] and TiO2 based thin film de positions .
References:
1.J.Appl Phys. 2013 113. 021301.
2.Microelectron Eng 2009 86 72
3.J Vac. Sci Tech A 2018 36 06A105
4.Appl Surf Sci 2018 462. 1029
5.J App. Phys. 2007. 102. 083521
6.J Electrochem. Soc. 2008 155. H688.