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Sku 28-1301-25G
STREM
| Technical Notes: 1. Precursor for the Plasma-assisted atomic layer deposition and post-annealing, enhancement of low resistivity and oxygen-free nickel nano-films with ammonia as co-reactant 2.Precursor for the ALD of nickel oxide thin films 3.Precursor for the metalorganic chemical vapor deposition of Ni Films -6 References: 1.Journal of Materials Chemistry c, 2016, 4(47), 11059. 2.Chemical vapor deposition, 2011, 17, 177-180. 3.Thin solid films, 2001, 391, 57-61 4.Electrochem. Solid-State L ett. 2002, 5(6), C64-C66 5.Journal of Materials Research, 2000, 15(8), 1828-1833 . 6.Chem. Vap. Deposition, 1999, 5, 135-142. 7.Chem. Vap. Deposition, 1999, 5, 143-149. |
