Tri-t-butoxysilanol (99.9+%-Si)

$66.00
Technical Note:1. Silicon oxide source for rapid atomic layer deposition to prepare various nanolaminates.References:1. Nanoscale, 2013, 5, 11 856.2.Mater. Research Bulletin, 2012, 47, 3004. 

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Sku: 14-7028-5G
STREM
Technical Note:
1. Silicon oxide source for rapid atomic layer deposition to prepare various nanolaminates.
References:
1. Nanoscale, 2013, 5, 11 856.
2.Mater. Research Bulletin, 2012, 47, 3004.