Thin film deposition technologies including Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) play a vital role in enabling the performance and reliability of today’s advanced materials and electronic devices. These precision coating techniques are widely used in industrial manufacturing, where uniformity, conformality and purity are critical to success.

1. Semiconductor & Microelectronics Manufacturing

ALD/CVD are core processes in the semiconductor value chain used to deposit high-κ dielectrics, metal gate materials and diffusion barriers at the atomic scale.

Applications include:

• Gate oxide and metal gate films (e.g., HfO₂, Al₂O₃, TiN)
• Copper and tungsten barrier/seed layers
• 3D NAND, FinFET, and advanced logic node fabrication
• Passivation and encapsulation coatings

Industrial Impact:
ALD enables atomic-level precision and superior step coverage, essential for sub-10nm semiconductor nodes.

2. Display & Optoelectronic Devices

ALD and CVD processes ensure uniform thin films in large-area display and lighting.

Applications include:

• Transparent conductive oxides (ITO, ZnO, SnO₂) for touchscreens and OLEDs
• Encapsulation layers for flexible and micro-LED displays
• Thin film transistors (TFTs) in LCD and AMOLED panels

Benefits: enhanced device stability, flexibility and optical clarity.

3. Photovoltaic and Energy Storage Materials

In renewable energy, ALD/CVD provide high-quality, conformal coatings that improve device performance and longevity.

Applications include:

• Anti-reflective coatings and passivation layers for solar cells
• Protective coatings for perovskite and thin-film photovoltaics
• Electrode coatings in Li-ion and solid-state batteries
• Catalytic coatings for fuel cells and hydrogen production

Benefit: enhanced efficiency, corrosion resistance and cycle life for energy devices.

4. Advanced Coatings and Protective Layers

CVD and ALD are also employed in functional coatings across various high-performance industries.

Applications include:

• Aerospace: corrosion-resistant, thermal barrier films
• Optical components: anti-reflective or high-index coatings
• MEMS/NEMS devices: surface functionalization
• Sensors: selective gas-permeable coatings

Example: ALD-grown alumina (Al₂O₃) layers provide excellent moisture and chemical protection in harsh industrial environments.

5. Emerging Manufacturing and Research Applications

Beyond traditional microelectronics, ALD and CVD technologies are expanding into new industrial frontiers:

• Catalyst support materials for chemical industries
• Coatings for medical implants and diagnostics
• Nanomaterial synthesis (CNTs, graphene, TMDs)
• Additive manufacturing (surface modification of 3D-printed components)

As industries shift toward miniaturization and high functionality, ALD/CVD will remain essential for atomic-scale precision engineering.

J&K Scientific Supply the Industrial Thin Film Ecosystem

Through collaboration with Strem Chemicals (Ascensus Specialties), J&K Scientific delivers industrial-grade precursors, delivery systems and services tailored for large-scale thin film manufacturing.

• High-purity ALD/CVD precursors (99.9999%)
• DOT-certified bubblers & cylinders for fab operations
• Custom filling, cleaning, and testing for process hardware
• Bulk supply chain support for semiconductor and energy industries

Enabling industrial innovation from R&D labs to full-scale production lines.