Hexamethyldisiloxane, 97+% HMDSO

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Sku 14-7125-50G
STREM
Technical Notes：
1.Organosilicon precursor used in the plasma- enhanced chemical vapour deposition (PECVD) process of super hydrophobic C-rich polymeric (silicone-like, SiCx yOz) and doped semiconducting SiOẞfilms and coatings [1-7].
References:
1.Appl. Surf. Sci., 2010, 256, 2509
2.J. Phys. Chem. c, 2011, 115, 22225
3.Appl. Surf. Sci., 2011, 257, 3786
4.RSC Adv., 2014, 4, 45442
5.Thin Solid Films, 2015, 590, 299
6.Surf. Coat. Tech., 2016, 225
7.Nanomaterials, 2018, 8, 530