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| Technical Notes Mixed alkyl-cyclopentadienyl precursor for the deposition of platinum thin films by CVD, ALD and FEBID due, in part, to its simplicity (only c, H and Pt), volatility and moderate decomposition temperatures.: References: 1. Mat. Res. Soc. Symp. Proc., 1988, 131, 395. 2. J. Am. Chem. Soc., 1989, 111, 8779. 3. J. Vac. Sci. Technol. B, 1990, 8, 1826. 4. Chem. Mater., 2003, 15, 1924. 5.J. Electrochem. Soc., 2007, 154, D648. 6.ESL, 2009, 12, G34. 7.Chem. Mater., 2010, 22, 251 7 8. Adv. Funct. Mater., 2010, 20, 3099. 9.Electrochim. Acta., 2012, 75, 101. 10. Chem. Mater., 2012, 24, 1752. 11. Chem. Mater., 2013, 25, 1769. 12.J. Phy. Chem. c., 2014, 118, 14009. 13.J. Vac. Sci. Technol. B, 1991, 9, 1 62. 14.J. Electrochem. Soc., 1997, 144, 2848. 15. Chem. Vap. Deposition, 2013, 19, 274. |
