Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM

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Sku 72-8000-25G
STREM
Technical Notes: 1.ALD/CVD precursor for Hf thin film deposition.
References:
1. Chem. Mater. 2002. 14, 4350.
2.J. Am. Chem. Soc. 2006, 128, 3518.
3.Appl. Phys. L ett. 2007, 90, 182907.
4.Chem. Mater. 2004, 16.3497 .
5.Chem. Mater._ 2001 A 13. 2463.
6.Appl.Surf._ Sci.. 2014. 321, 214.
7.Adv. Mater. Interfaces 2020, Z, 2001493.