(t-Butylimido)tris(diethylamino)niobium(V), min. 98% TBTDEN

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Sku 41-0450-5G
STREM
Technical Notes:
1.ALD/CVD precursor for niobium thin film de position
2.J. Chinese ( hem. Soc.1998 45, 355
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5.J.Vac.Sci.Technol. A.2017 35.01B143 6.Thin Solid Films 2020. 709._ 138232
7.Supercond. Sci. Techno/. 201 7.30, 095010
8.J.Vac. Sci. Technol. A. 2020. 38. 022408
9.ACS Appl. Nano Mater. 2021. 4.514
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