(t-Butylimido)tris(diethylamino)niobium(V), min. 98% TBTDEN

$574.00
Technical Notes:1.ALD/CVD precursor for niobium thin film de position2.J. Chinese ( hem. Soc.1998 45, 3553.Chem. Mater. 2012. 24. 9754.J. Vac. Sci. Techno/. A. 2018. 36. 041503 Chem. Vap. [ eposition...

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Sku: 41-0450-5G
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STREM
Technical Notes:
1.ALD/CVD precursor for niobium thin film de position
2.J. Chinese ( hem. Soc.1998 45, 355
3.Chem. Mater. 2012. 24. 975
4.J. Vac. Sci. Techno/. A. 2018. 36. 041503 Chem. Vap. [ eposition 2009.15.334
5.J.Vac.Sci.Technol. A.2017 35.01B143 6.Thin Solid Films 2020. 709._ 138232
7.Supercond. Sci. Techno/. 201 7.30, 095010
8.J.Vac. Sci. Technol. A. 2020. 38. 022408
9.ACS Appl. Nano Mater. 2021. 4.514
]