$105.00
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Sku 40-1028-500MG
STREM
| Technical Notes: 1. Precursor for the atomic layer deposition of zirconium oxide using water or ozone as co -reactants.1-6 References: 1.J. Electrochem. Soc. 2010, 157 (10), G202-G210. 2.Thin Solid Films, 2010, 519 (2), 666-673. 3. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2009, 27, 389. 4.Chem. Mater., 2008, 20 (17), 5698-5705 5.Chemical vapor deposition, 2008, 14, 358-365 6. Journal of Materials Chemistry, 2008, 28, 3385-3390. |
