Bis(mu-dimethylamino)tetrakis(dimethylamino)digallium, 98%

$1,469.00
Technical Notes:1. AL D/CVD precursor for gallium thin film depositionReferences:1. Polyhedron 1990, 9, 2572. J. Vac. Sci. Technol. A, 1996, 14, 306 3. Chem. Mater. 2006, 18, 4714.ECS Trans. 2009,...

FREE
SHIPPING

100% MONEY
BACK GUARANTEE

ONLINE
SUPPORT 24/7

Availability: In Stock
Available on backorder. No lead time available. Please request a quote.

Learn more about shipping rates

Sku: 31-2030-25G
Dangerous Goods

*Handling fees may be applied. Please request for quote

STREM
Technical Notes:
1. AL D/CVD precursor for gallium thin film deposition
References:
1. Polyhedron 1990, 9, 257
2. J. Vac. Sci. Technol. A, 1996, 14, 306
3. Chem. Mater. 2006, 18, 471
4.ECS Trans. 2009, 25, 617
5.Dalton Trans.. 2017, 46, 16551
6.J. Mater. Chem.. 2007, 17, 1308
7.J Vac. Sci. Technol. A, 2019, 37, 030906
8.ACS Appl. Energy Mater. 2020, 3, 7208
9.Chem. Mater. 2014., 26, 1 029
10. Mater. Today hem. 2018, 10, 142
11. J Mater. Chem. C, 2020, 8. 8457