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Sku 29-7120-250MG
STREM
Technical Note: 1.AL D/CVD precursor for the preparation of Cu, Cu2O, or Cu2S films for electronic applications at temperatures ranging from 135 to 170'C. The Tsubl = 90'C/0.05 Torr and has a decomposition te mperature of 1 85-188C. References: 1.Chem. Mater., 2011, 23, 441 1 2.Chem. Mater., 2014, 26, 3731 3.J. Phys. Chem. c 2015, 119, 9375 4.Dalton Trans., 2015, 44, 10188 5.Chem. Mater. 2016, 28, 6282 6.Dalton Trans., 2017, 46, 5790 7.Chem. Mater. 2017, 29, 6502 |