Bis(dimethylamino-2-propoxy)copper(II), min. 97% Cu(dmap)2

$79.00
Technical Note:1.AL D/CVD precursor for the preparation of Cu, Cu2O, or Cu2S films for electronic applications at temperatures ranging from 135 to 170'C. The Tsubl = 90'C/0.05 Torr and has...

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Sku: 29-7120-250MG
STREM
Technical Note:
1.AL D/CVD precursor for the preparation of Cu, Cu2O, or Cu2S films for electronic applications at temperatures ranging from 135 to 170'C. The Tsubl = 90'C/0.05 Torr and has a decomposition te mperature of 1 85-188C.
References:
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2.Chem. Mater., 2014, 26, 3731
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4.Dalton Trans., 2015, 44, 10188
5.Chem. Mater. 2016, 28, 6282
6.Dalton Trans., 2017, 46, 5790
7.Chem. Mater. 2017, 29, 6502