$132.00
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Sku 14-7030-5G
STREM
| Technical Notes: 1.Plasma-Assisted ALD for the Conformal Deposition of SiO2 Room-Temperature ALD of Metal Oxide Thin Films by Energy- Enhanced AL D 2.Atomic L ayer Deposition of Silica on Carbon Nanotubes 3.Area-Selective Atomic L ayer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle References: 1.J. Electrochem. Soc., 2012, 159, H277. 2.Chem. Vap. Deposition, 2013, 19, 125. 3.Chem. Mater., 2017, 29, 4920. 4.ACS Nano, 2017, 11, 9303. |
