Bis(dimethylamino)dimethylsilane, 99+% BDMADMS

$51.00
Technical Notes:1. Used in the chemical vapor deposition of silicon nitride films, and also, the atomic layer deposition of SiN.Cy dielectric sealing layers using plas ma-enhanced atomic layer deposition (P.2.Used...

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Sku: 14-1530-5G
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STREM
Technical Notes:
1. Used in the chemical vapor deposition of silicon nitride films, and also, the atomic layer deposition of SiN.Cy dielectric sealing layers using plas ma-enhanced atomic layer deposition (P
.2.Used as a reagent for silylation.

References:
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2.Materials Science in Semiconductor 3.Processing 2015, 29, 139.
4.Applied Surface Science, 2010, 257(4). 1 196.
5.Surface and Coatings Technology. 2008, 202(9), 1606.
6.Microelectronic Engineering, 1991. 13(1-4), 4
7.Joural of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures, 1990, 8(6), 1481.