$1,521.00
Available on backorder. No lead time available. Please request a quote.
Sku 13-4500-25G
STREM
| Technical Notes: 1. An overlooked atomic layer deposition precursor. 2. Stoichiometric and catalytic Si-N bond formation using the p-block base TDMAA. References: 1. Journal of Vacuum Science & Technology, A: Vacuum, Surfaces and Films, 2017, 35, 01B1 28/1. 2. Dalton Transactions, 2015, 44, 12112. |
![Tris[μ-[2-amino-1,4-benzenedicarboxylato(2-)-κO1:κO'1]]diaquachloro-μ3-​oxotri-aluminum MOF, MIL-101(Al)-NH2| CAS: 1404201-64-4](http://www.jk-sci.com/cdn/shop/products/13-3060_200x200_crop_center.gif?v=1642832309)
